Specific Process Knowledge/Lithography/Development: Difference between revisions
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===Process information=== | ===Process information=== | ||
''' | '''Standard recipes''' | ||
*nLoF_40x2 | *nLoF_40x2: double puddle, 40s. For development of AZ nLOF 2020 resist. | ||
*MiR701 60s | *MiR701 60s: single puddle, 60s. For development of AZ MiR 701 resist. | ||
*DUV 60s | *DUV 60s: single puddle, 60s. For development of DUV resists. | ||
*UTIL-BE | *UTIL-BE: For service use only. | ||
*UTIL-DR | *UTIL-DR: Dome rinse. | ||
=== Equipment performance and process related parameters === | === Equipment performance and process related parameters === | ||