Specific Process Knowledge/Lithography/Development: Difference between revisions
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'''AZ 5214E:''' | '''AZ 5214E:''' | ||
*1.5µm resist: 60 sec | *1.5µm resist: 60 sec | ||
*2.2µm resist: 70 sec | |||
*4.2µm resist: 3 min | |||
'''AZ 4562:''' | |||
*10µm resist: 5 min | |||
=== Equipment performance and process related parameters === | === Equipment performance and process related parameters === | ||