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Specific Process Knowledge/Lithography/Development: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
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*Before using one of developer baths, please check the "Litho4_Dev-7up-KOH" logbook to find out when they were last used. A fresh bath can be reused without problems.  
*Before using one of developer baths, please check the "Litho4_Dev-7up-KOH" logbook to find out when they were last used. A fresh bath can be reused without problems.  
*The main rule is a developer made yesterday must be changed.  
*The main rule is a developer made yesterday must be changed.  
*Substrates are rinsed with water for 4-5 min. after development.
*Rinse substrates with water for 4-5 min. after development.
*Substrates can been spin-dried or dried with nitrogen gun after the rinse.  
*Spin-dry substrates or dry with nitrogen gun after rinsing.  


'''Standard development time using vigorous agitation:'''
'''Standard development time using vigorous agitation:'''
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