Specific Process Knowledge/Lithography/Development: Difference between revisions
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*Substrates can been spin-dried or dried with nitrogen gun after the rinse. | *Substrates can been spin-dried or dried with nitrogen gun after the rinse. | ||
'''Standard development | '''Standard development time using vigorous agitation:''' | ||
'''AZ 5214E:''' | '''AZ 5214E:''' | ||