Specific Process Knowledge/Lithography/Development: Difference between revisions
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*Before using a one of developer batch's please check the "Litho4_Dev-7up-KOH" logbook to find out when they were used last time. A fresh bath can be reused without problems. | *Before using a one of developer batch's please check the "Litho4_Dev-7up-KOH" logbook to find out when they were used last time. A fresh bath can be reused without problems. | ||
*The main rule is a developer from yesterday must be changed. | *The main rule is a developer from yesterday must be changed. | ||
*Substrates are rinsed with water for 4-5 min. after development. | *Substrates are rinsed with water for 4-5 min. after development. | ||
*Substrates can been spin-dried or dried with nitrogen gun after the rinse. | *Substrates can been spin-dried or dried with nitrogen gun after the rinse. | ||
'''Standard development times using vigorous agitation:''' | ''''Standard development times using vigorous agitation:'''' | ||
'''AZ 5214E:''' | '''AZ 5214E:''' | ||