Specific Process Knowledge/Lithography/Development: Difference between revisions
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| Line 144: | Line 144: | ||
''Standard development times'' | ''Standard development times'' | ||
AZ 5214E: | '''AZ 5214E:''' | ||
*1.5µm resist | *1.5µm resist: 60 sec | ||
*2.2µm resist | *2.2µm resist: 70 sec | ||
*4.2µm resist | *4.2µm resist: 3 min | ||
AZ 4562: | '''AZ 4562:''' | ||
*10µm resist | *10µm resist: 5 min | ||
====Procedure for making a new developer==== | ====Procedure for making a new developer==== | ||