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Specific Process Knowledge/Lithography/Development: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
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==SU8-Developer==
[[Image:KSspinner.JPG|300×300px|right|thumb|Developer-TMAH is placed in C-1]]
'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Development#SU8-Developer click here]'''
SU8-Developer is a manually operated, ...
'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=154 LabManager]'''
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=== Equipment performance and process related parameters ===
{| border="2" cellspacing="0" cellpadding="2"
!style="background:silver; color:black;" align="center" width="60"|Purpose
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Development of
*SU-8
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!style="background:silver; color:black;" align="center" width="60"|Developer
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black" align="center"|
PGMEA
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!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Method
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Submersion
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters
|style="background:LightGrey; color:black"|Temperature
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Room temperature
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|style="background:LightGrey; color:black"|Agitation
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Magnetic stirrer
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
|style="background:LightGrey; color:black"|Substrate size
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* 100 mm wafers
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| style="background:LightGrey; color:black"|Allowed materials
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All Silicon and glass substrates
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|style="background:LightGrey; color:black"|Batch
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1-8
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