Specific Process Knowledge/Lithography/Development: Difference between revisions
Appearance
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!style="background:silver; color:black;" align="center" width="60"|Purpose | !style="background:silver; color:black;" align="center" width="60"|Purpose | ||
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Development of | Development of | ||
*AZ nLOF | *AZ nLOF | ||
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*AZ 4562 | *AZ 4562 | ||
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!style="background:silver; color:black;" align="center" width="60"|Developer | !style="background:silver; color:black;" align="center" width="60"|Developer | ||
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AZ 726 MIF (2.38% TMAH in water) | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Method | !style="background:silver; color:black" align="center" valign="center" rowspan="1"|Method | ||
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Puddle | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | ||
|style="background:LightGrey; color:black"|Temperature | |style="background:LightGrey; color:black"|Temperature | ||
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Room temperature | |||
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|style="background:LightGrey; color:black"|Agitation | |style="background:LightGrey; color:black"|Agitation | ||
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none | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
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* 100 mm wafers | * 100 mm wafers | ||
* 150 mm wafers | * 150 mm wafers | ||
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| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
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All | All Silicon, glass and polymer substrates | ||
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|style="background:LightGrey; color:black"|Batch | |style="background:LightGrey; color:black"|Batch | ||