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Specific Process Knowledge/Lithography/Development: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
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*Spin coating and soft baking UV sensative resists
Development of
*Spin coating SU8 resists
*AZ nLOF
*AZ MiR 701
*AZ 5214E
*AZ 4562
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!style="background:silver; color:black;" align="center" width="60"|Developer chemistry  
!style="background:silver; color:black;" align="center" width="60"|Developer chemistry  
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