Specific Process Knowledge/Lithography/Development: Difference between revisions

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-==KS Spinner==
+==Developer-TMAH==
-[[Image:KSspinner.JPG|300×300px|right|thumb|The KS spinner is placed in C-1]]
+[[Image:KSspinner.JPG|300×300px|right|thumb|Developer-TMAH is placed in C-1]]
-'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#KS_Spinner click here]'''
+'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Development#Developer-TMAH click here]'''
-At Danchip we have RC8-THP system which is one of the SUSS MicroTech spinners.
+Developer-TMAH is a manually operated, single substrate spray-puddle developer. It uses the TMAH based AZ 726 MIF developer (2.38 % TMAH in  water with a small amount of wetting agent).
-The main purpose of this equipment is experimental spinning the different resist.The spinner has one resist line, AZ5214E, for automatic dispense. All other resist dispenses manually from syringe or disposable pipettes. All SU8 spinning are done on this machine.
-The machine can be also used for spinning on the "difficult" surfaces like the substrates with holes, backside structures and unusual shapes.
-'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=43 LabManager]'''
+'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager]'''
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