Specific Process Knowledge/Lithography/Development: Difference between revisions

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 '''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Developer-1_and_Developer-2 click here]'''
 Developer-1 and Developer-2
-There are 2 developer baths, develop 1 and develop 2, witch are the same.
+===Process information===
-Here are some main rules for developer baths use:
+*Before using a one of developer batch's please check the "Litho4_Dev-7up-KOH" logbook to find out when they were used last time. A fresh bath can be reused without problems.
-*Before using a one of developer batch's please check the "Lithography logbog1" to find out when they were used last time. The fresh bath can be easily reused.
 *The main rule is the develop from yesterday must be changed.
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 *2.2µm resist is 70 sec
 *4.2µm resist is 3 min
-*9,5µm resist is 5min.
+*10µm resist is 5 min
-====The procedure for making a fresh developer====
+====The procedure for making a new developer====
 . 800ml "Developer AZ 351" is mixed with 4000ml water in a special container in the fume hood.