Specific Process Knowledge/Lithography/Development: Difference between revisions
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== | ==Developer-1 and Developer-2== | ||
[[Image:SSEspinner2.jpg|200 × 200px|thumb|right|The SSE spinner MAXIMUS: positioned in E-5]] | [[Image:SSEspinner2.jpg|200 × 200px|thumb|right|The SSE spinner MAXIMUS: positioned in E-5]] | ||
'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters# | '''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Developer-1_and_Developer-2 click here]''' | ||
SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment is a resist spinning system at Danchip which can be used for spinning on 2", 4" and 6" substrates. | SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment is a resist spinning system at Danchip which can be used for spinning on 2", 4" and 6" substrates. | ||
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*2 syringe lines, which can be used for spinning of e-beam resist. | *2 syringe lines, which can be used for spinning of e-beam resist. | ||
'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=188 LabManager]''' | '''The user manual, user APV, and contact information can be found in LabManager [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=188 LabManager] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=188 LabManager]''' | ||