Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
No edit summary |
|||
| Line 15: | Line 15: | ||
*'''5'''. The remaining material forms the desired pattern on the substrate. | *'''5'''. The remaining material forms the desired pattern on the substrate. | ||
<br clear="all" /> | |||
=Lift-off wet bench= | |||
[[Image:Lift-off wet bench.JPG|300x300px|thumb|Lift-off wet bench in D-3]] | |||
'''The user manual, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=71 LabManager]''' | |||
== Process information == | |||
Lift-off wet bench is used for lift-off using resists soluble in acetone. AZ 5214E is soluble in acetone, cross linked AZ nLOF is not. | |||
For information on image reversal of AZ 5214E, see here: [[media:Process_Flow_AZ5214E_rev_vers2.docx |Process_Flow_AZ5214_rev.docx]] | |||
<br clear="all" /> | |||
=Lift-off (4", 6")= | |||
[[Image:Lift-off 4&6.JPG|300x300px|thumb|Lift-off (4", 6") in D-3]] | |||
'''The user manual, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=255 LabManager]''' | |||
== Process information == | |||
Lift-off (4", 6") is used for lift-off using resists that are soluble in NMP (''N''-Methyl-Pyrrolidone), supplied in the cleanroom as "Remover 1165". Both AZ 5214E and AZ nLOF are soluble in NMP. | |||
For information on processing of AZ nLOF, see here: [[media:Process_Flow_AZ_nLOF_2020.docx|Process_Flow_AZ_nLOF_2020.docx]] | |||
<br clear="all" /> | <br clear="all" /> | ||
| Line 83: | Line 106: | ||
|} | |} | ||
<br clear="all" /> | <br clear="all" /> | ||