Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
Appearance
| Line 107: | Line 107: | ||
Lift-off (4", 6") is used for lift-off using resists that are soluble in NMP (''N''-Methyl-Pyrrolidone), supplied in the cleanroom as "Remover 1165". Both AZ 5214E and AZ nLOF are soluble in NMP. | Lift-off (4", 6") is used for lift-off using resists that are soluble in NMP (''N''-Methyl-Pyrrolidone), supplied in the cleanroom as "Remover 1165". Both AZ 5214E and AZ nLOF are soluble in NMP. | ||
For information on processing of AZ nLOF, see here: [[media:Process_Flow_AZ_nLOF_2020.docx|Process_Flow_AZ_nLOF_2020.docx]] | |||
<br clear="all" /> | <br clear="all" /> | ||