Specific Process Knowledge/Lithography/LiftOff: Difference between revisions

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 Lift-off wet bench is used for lift-off using resists soluble in acetone. AZ 5214E is soluble in acetone, AZ nLOF is not.
-'''Process recommandations for Lift-off wet bench:'''
+For more information on image reversal of AZ 5214E, see here: [[media:Process_Flow_AZ5214E_rev_vers2.docx‎ |Process_Flow_AZ5214_rev_vers2.docx‎]]
-*Place the wafers in a dedicated wafer holder.
-*Put the holder in the acetone and start the ultrasound. The strip off time is depending of resist thickness.
-*Rinse your wafers for 4-5 min. in running water after stripping.
-For more information on image reversal of AZ 5214E, see here: [[Specific Process Knowledge/Photolithography/AZ5214E standard resist - reverse process]]
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