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Specific Process Knowledge/Lithography/LiftOff: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:WhiteSmoke; color:black" align="center"|<b>[[Specific Process Knowledge/Lithography/LiftOff#Lift-off Wet Bench|Lift-off Wet Bench]]</b>
|style="background:WhiteSmoke; color:black" align="center"|<b>[[Specific Process Knowledge/Lithography/LiftOff#Lift-off wet bench|Lift-off wet bench]]</b>
|style="background:WhiteSmoke; color:black" align="center"|<b>[[Specific Process Knowledge/Lithography/LiftOff#Lift-off (4", 6")|Lift-off (4", 6")]]</b>
|style="background:WhiteSmoke; color:black" align="center"|<b>[[Specific Process Knowledge/Lithography/LiftOff#Lift-off (4", 6")|Lift-off (4", 6")]]</b>
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=Lift-off Wet Bench=
=Lift-off wet wench=
[[Image:Lift-off wet bench.JPG|300x300px|thumb|Lift-off wet bench in D-3]]
[[Image:Lift-off wet bench.JPG|300x300px|thumb|Lift-off wet bench in D-3]]


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== Process information ==
== Process information ==
Lift-off Wet Bench is used for lift-off using resists soluble in acetone. AZ 5214E is soluble in acetone, AZ nLOF is not.
Lift-off wet bench is used for lift-off using resists soluble in acetone. AZ 5214E is soluble in acetone, AZ nLOF is not.


'''Process recommandations for Lift-off Wet Bench:'''
'''Process recommandations for Lift-off wet bench:'''
*Place the wafers in a dedicated wafer holder.
*Place the wafers in a dedicated wafer holder.
*Put the holder in the acetone and start the ultrasound. The strip off time is depending of resist thickness.  
*Put the holder in the acetone and start the ultrasound. The strip off time is depending of resist thickness.  
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== Process information ==
== Process information ==
Lift-off Wet Bench is used for lift-off using resists that are soluble in NMP (''N''-Methyl-Pyrrolidone), supplied in the cleanroom as "Remover 1165". Both AZ 5214E and AZ nLOF are soluble in NMP.
Lift-off (4", 6") is used for lift-off using resists that are soluble in NMP (''N''-Methyl-Pyrrolidone), supplied in the cleanroom as "Remover 1165". Both AZ 5214E and AZ nLOF are soluble in NMP.


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