Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
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Lift-off Wet Bench is used for lift-off using resists soluble in acetone. AZ 5214E is soluble in acetone, AZ nLOF is not. | Lift-off Wet Bench is used for lift-off using resists soluble in acetone. AZ 5214E is soluble in acetone, AZ nLOF is not. | ||
'''Process recommandations for Lift-off | '''Process recommandations for Lift-off Wet Bench:''' | ||
*Place the wafers in a dedicated wafer holder. | *Place the wafers in a dedicated wafer holder. | ||
*Put the holder in the acetone and start the ultrasound. The strip off time is depending of resist thickness. | *Put the holder in the acetone and start the ultrasound. The strip off time is depending of resist thickness. | ||