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Specific Process Knowledge/Lithography/LiftOff: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
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== Process information ==
== Process information ==


Here are the main rules for lift-off bench use:
Process recommandations for Lift-off wet bench:
*Place the wafers in a dedicated wafer holder.
*Place the wafers in a dedicated wafer holder.
*Put the holder in the acetone and start the ultrasound. The strip off time is depending of resist thickness.  
*Put the holder in the acetone and start the ultrasound. The strip off time is depending of resist thickness.  
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