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Specific Process Knowledge/Lithography/LiftOff: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
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*Rinse your wafers for 4-5 min. in running water after stripping.
*Rinse your wafers for 4-5 min. in running water after stripping.


Find more info about the lift-off process here: [[Specific Process Knowledge/Photolithography/AZ5214E standard resist - reverse process]]
For more information on image reversal of AZ 5214E, see here: [[Specific Process Knowledge/Photolithography/AZ5214E standard resist - reverse process]]
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