Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
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=Lift-off Wet Bench= | =Lift-off Wet Bench= | ||
[[Image:Acetone_lift-off.jpg|300x300px|thumb|Acetone lift-off: positioned in cleanroom 3]] | [[Image:Acetone_lift-off.jpg|300x300px|thumb|Acetone lift-off: positioned in cleanroom 3]] | ||
This bench is only for wafers with metal! | |||
'''The user manual, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=255 LabManager]''' | '''The user manual, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=255 LabManager]''' | ||
== Process information == | |||
Here are the main rules for lift-off bench use: | Here are the main rules for lift-off bench use: | ||