Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
| Line 65: | Line 65: | ||
=Lift-off Wet Bench= | =Lift-off Wet Bench= | ||
[[Image:Acetone_lift-off.jpg|300x300px|thumb|Acetone lift-off: positioned in cleanroom 3]] | [[Image:Acetone_lift-off.jpg|300x300px|thumb|Acetone lift-off: positioned in cleanroom 3]] | ||
'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=255 LabManager]''' | |||
This bench is only for wafers with metal! | This bench is only for wafers with metal! | ||
| Line 74: | Line 77: | ||
Find more info about the lift-off process here: [[Specific Process Knowledge/Photolithography/AZ5214E standard resist - reverse process]] | Find more info about the lift-off process here: [[Specific Process Knowledge/Photolithography/AZ5214E standard resist - reverse process]] | ||
<br clear="all" /> | <br clear="all" /> | ||
=Lift-off (4", 6")= | =Lift-off (4", 6")= | ||
bla bla bla | bla bla bla | ||
Revision as of 15:28, 5 March 2014
Feedback to this page: click here
Comparing Lift-off equipment
| Equipment | Lift-off Wet Bench | Lift-off (4", 6") | |
|---|---|---|---|
| Purpose |
|
| |
| Bath chemical |
Acetone |
NMP (Remover 1165) | |
| Process parameters | Process temperature |
Room temperature |
Heating of the bath is possible. The heating has been limited to 37°C |
| Ultrasonic agitation |
Continuous |
Continuous or pulsed | |
| Substrates | Substrate size |
|
|
| Allowed materials |
All cleanroom materials |
All cleanroom materials | |
| Batch |
1 - 25 |
1 - 8 | |
Lift-off Wet Bench
The user manual, user APV, and contact information can be found in LabManager
This bench is only for wafers with metal!
Here are the main rules for lift-off bench use:
- Place the wafers in a dedicated wafer holder.
- Put the holder in the acetone and start the ultrasound. The strip off time is depending of resist thickness.
- Rinse your wafers for 4-5 min. in running water after stripping.
Find more info about the lift-off process here: Specific Process Knowledge/Photolithography/AZ5214E standard resist - reverse process
Lift-off (4", 6")
bla bla bla