Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
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=Lift-off Wet Bench= | =Lift-off Wet Bench= | ||
[[Image:Acetone_lift-off.jpg|300x300px|thumb|Acetone lift-off: positioned in cleanroom 3]] | [[Image:Acetone_lift-off.jpg|300x300px|thumb|Acetone lift-off: positioned in cleanroom 3]] | ||
'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=255 LabManager]''' | |||
This bench is only for wafers with metal! | This bench is only for wafers with metal! | ||
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Find more info about the lift-off process here: [[Specific Process Knowledge/Photolithography/AZ5214E standard resist - reverse process]] | Find more info about the lift-off process here: [[Specific Process Knowledge/Photolithography/AZ5214E standard resist - reverse process]] | ||
<br clear="all" /> | <br clear="all" /> | ||
=Lift-off (4", 6")= | =Lift-off (4", 6")= | ||
bla bla bla | bla bla bla | ||