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Specific Process Knowledge/Thermal Process/A4 Phosphor Pre-dep furnace: Difference between revisions

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Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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'''The user manual, technical information and contact information can be found in LabManager:'''
'''The user manual, technical information and contact information can be found in LabManager:'''


'''[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=83 Phosphorus Predep furnace (A4)]'''
'''[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=83 Phosphorus Pre-dep furnace (A4)]'''


== Process knowledge ==
== Process knowledge ==
*[[Specific Process Knowledge/Thermal Process/Dope with Phosphorus|Dope with Phosphorus]]
*[[Specific Process Knowledge/Thermal Process/Dope with Phosphorus|Dope with Phosphorus]]


==Overview of the performance of the Phosphoris Pre-dep furnace and some process related parameters==
==Overview of the performance of the Phosphorus Pre-dep furnace and some process related parameters==


{| border="2" cellspacing="0" cellpadding="0"  
{| border="2" cellspacing="0" cellpadding="2"  
|-
|-
!style="background:silver; color:black;" align="center"|Purpose  
!style="background:silver; color:black;" align="center"|Purpose  
|style="background:LightGrey; color:black"|Doping of Phosphor
|style="background:WhiteSmoke; color:black"|
|-
!style="background:silver; color:black" align="center"|Performance
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
*Phosphorus pre-deposition using POCL
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Look at Process knowladge
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameter range
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameter range
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|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*1-30 4" wafer (or 2" wafers) per run
*1-30 100 mm wafers (or 50 mm wafers) per run
|-
|-
| style="background:LightGrey; color:black"|Substrate material allowed
| style="background:LightGrey; color:black"|Substrate materials allowed
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Silicon wafers (RCA cleaned)
*Silicon wafers (RCA cleaned)
|-
|-
|}
|}
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