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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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|Recipe name  
|Recipe name  
|SiH<sub>4</sub> flow [sccm]
|SiH<sub>4</sub> flow [sccm]
|N<sub>2</sub>O flow [sccm]
|N<sub>2</sub> flow [sccm]
|N<sub>2</sub> flow [sccm]
|GeH<sub>4</sub> flow [sccm] (scaled by 100)
|GeH<sub>4</sub> flow [sccm] (scaled by 100)
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