Specific Process Knowledge/Thin film deposition: Difference between revisions
| Line 106: | Line 106: | ||
[[/Deposition of Titanium Oxide|Titanium Oxide]]<br/> | [[/Deposition of Titanium Oxide|Titanium Oxide]]<br/> | ||
|style="background: #DCDCDC"| | |style="background: #DCDCDC"| | ||
[[/Deposition of Silicon|Silicon]] | [[/Deposition of Silicon|Silicon]] <br/> | ||
[[/Deposition of Germanium|Germanium]] | |||
|style="background: LightGray"| | |style="background: LightGray"| | ||
[[/Deposition of Aluminium|Aluminium]] <br/> | [[/Deposition of Aluminium|Aluminium]] <br/> | ||
| Line 113: | Line 114: | ||
[[/Deposition of Nickel|Nickel]]<br/> | [[/Deposition of Nickel|Nickel]]<br/> | ||
[[/Deposition of Copper|Copper]]<br/> | [[/Deposition of Copper|Copper]]<br/> | ||
[[/Deposition of Molybdenum|Molybdenum]]<br/> | [[/Deposition of Molybdenum|Molybdenum]]<br/> | ||
[[/Deposition of Palladium|Palladium]]<br/> | [[/Deposition of Palladium|Palladium]]<br/> | ||