Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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== | == Aligner-6inch == | ||
'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch click here]''' | '''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch click here]''' | ||
[[Image:EVG620.jpg|300x300px|thumb|right|Aligner-6inch EVG620 is placed in Cleanroom 13.]] | [[Image:EVG620.jpg|300x300px|thumb|right|Aligner-6inch EVG620 is placed in Cleanroom 13.]] | ||
EVG620 aligner is designed for high resolution photolithography. | Aligner-6inch, EVG620 aligner, is designed for high resolution photolithography. | ||
The machine can be used for 2, 4 and 6 inch substrates. Cassette-to-cassette handling option is available only for 6inch substrates. | The machine can be used for 2, 4 and 6 inch substrates. Cassette-to-cassette handling option is available only for 6inch substrates. | ||
The automatic pattern recognition software is available for the special alignment marks design recommended of EVGroup. Please contact Danchip staff for further information. | The automatic pattern recognition software is available for the special alignment marks design recommended of EVGroup. Please contact Danchip staff for further information. | ||