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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Elkh (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
343 edits
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[[Image:IMG_3078.jpg|300x300px|thumb|III-V Aligner positioned in III-V cleanroom ]]
[[Image:IMG_3078.jpg|300x300px|thumb|III-V Aligner positioned in III-V cleanroom ]]


{| border="2" cellspacing="0" cellpadding="10"
 
|-
!style="background:silver; color:black" align="left" valign="top" rowspan="6"|Performance
|style="background:LightGrey; color:black"|substrate size
|style="background:WhiteSmoke; color:black"|
small pieces 1x1 cm up to 2inch"
|-
|style="background:LightGrey; color:black"|Exposure mode
|style="background:WhiteSmoke; color:black"|
soft contact, hard contact, proximity, flood exposure
|-
| style="background:LightGrey; color:black"|Exposure light/filters
|style="background:WhiteSmoke; color:black"|
365 nm, 405 nm
|-
|style="background:LightGrey; color:black"|Minimum structure size
|style="background:WhiteSmoke; color:black"|
~1µm
|-
|style="background:LightGrey; color:black"|Mask size
|style="background:WhiteSmoke; color:black"|
5x5inch
|-
|style="background:LightGrey; color:black"|Alignment modes
|style="background:WhiteSmoke; color:black"|
Top side only
|-
|}


=== Equipment performance and process related parameters ===
=== Equipment performance and process related parameters ===
Line 212: Line 185:
|-
|-


!style="background:silver; color:black" align="left" valign="top" rowspan="6"|Performance
!style="background:silver; color:black" align="left" valign="top" rowspan="5"|Performance
|style="background:LightGrey; color:black"|substrate size
 
|style="background:WhiteSmoke; color:black"|
small pieces 1x1 cm up to 2inch"
|-
|style="background:LightGrey; color:black"|Exposure mode
|style="background:LightGrey; color:black"|Exposure mode
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Line 227: Line 197:
|style="background:LightGrey; color:black"|Minimum structure size
|style="background:LightGrey; color:black"|Minimum structure size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
~1µm
down to 2µm
|-
|-
|style="background:LightGrey; color:black"|Mask size
|style="background:LightGrey; color:black"|Mask size
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|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
* 50 mm wafers
* 50 mm wafers
* 100 mm wafers
* small pieces 1x1cm
* 150 mm wafers
|-
|-
| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
All cleanroom materials except III-V materials
III-V materials
|-
|-
|style="background:LightGrey; color:black"|Batch
|style="background:LightGrey; color:black"|Batch
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
1 - 24
1  
|-  
|-  
|}
|}
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