Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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=== Equipment performance and process related parameters === | |||
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!style="background:silver; color:black;" align="center" width="60"|Purpose | |||
|style="background:LightGrey; color:black"| | |||
|style="background:WhiteSmoke; color:black"| | |||
*alignment and UV exposure | |||
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!style="background:silver; color:black" align="left" valign="top" rowspan="6"|Performance | |||
|style="background:LightGrey; color:black"|substrate size | |||
|style="background:WhiteSmoke; color:black"| | |||
small pieces 1x1 cm up to 2inch" | |||
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|style="background:LightGrey; color:black"|Exposure mode | |||
|style="background:WhiteSmoke; color:black"| | |||
soft contact, hard contact, proximity, flood exposure | |||
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| style="background:LightGrey; color:black"|Exposure light/filters | |||
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365 nm, 405 nm | |||
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|style="background:LightGrey; color:black"|Minimum structure size | |||
|style="background:WhiteSmoke; color:black"| | |||
~1µm | |||
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|style="background:LightGrey; color:black"|Mask size | |||
|style="background:WhiteSmoke; color:black"| | |||
5x5inch | |||
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|style="background:LightGrey; color:black"|Alignment modes | |||
|style="background:WhiteSmoke; color:black"| | |||
Top side only | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | |||
|style="background:LightGrey; color:black"|Substrate size | |||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |||
* 50 mm wafers | |||
* 100 mm wafers | |||
* 150 mm wafers | |||
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| style="background:LightGrey; color:black"|Allowed materials | |||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |||
All cleanroom materials except III-V materials | |||
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|style="background:LightGrey; color:black"|Batch | |||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |||
1 - 24 | |||
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