Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

Revision as of 13:30, 3 October 2013 view source Elkh (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 343 edits →Inclined UV Lamp ← Older edit		Revision as of 13:32, 3 October 2013 view source Elkh (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 343 edits →Inclined UV Lamp Newer edit →
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	[[Image:Inclined UV lamp_1.jpg\|~~200×200px~~\|right\|thumb\|Inclined UV lamp is placed in Cleanroom 13.]]		[[Image:Inclined UV lamp_1.jpg\|300×300px\|right\|thumb\|Inclined UV lamp is placed in Cleanroom 13.]]

	The Inclined UV lamp is 1000 W Hg(Xe)lamp source designed for near UV, 350-450nm, mid UV, 260-320nm, and deep UV, 220-260nm exposures of resists and polymers. The exposure source can be also used to make an inclined exposure in air or in the media tank.		The Inclined UV lamp is 1000 W Hg(Xe)lamp source designed for near UV, 350-450nm, mid UV, 260-320nm, and deep UV, 220-260nm exposures of resists and polymers. The exposure source can be also used to make an inclined exposure in air or in the media tank.