Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*1.25µm | *1.25µm | ||
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*2µm | |||
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|- | |- | ||
|style="background:LightGrey; color:black"|Exposure light/filters/spectrum | |style="background:LightGrey; color:black"|Exposure light/filters/spectrum | ||
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* | *350W Hg-lamp | ||
*the hole spectrum of 350W hg-lamp | |||
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*1000 W Hg(Xe)lamp source | *1000 W Hg(Xe)lamp source | ||
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*proximity, soft, hard, vacuum contact | *proximity, soft, hard, vacuum contact | ||
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*proximity, soft, hard, vacuum contact | *proximity, soft, hard, vacuum contact | ||
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*Flood exposure | |||
*Proximity exposure with home-made chuck and maskholder | |||
|- | |- | ||
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|style="background:LightGrey; color:black"|Positive Process | |style="background:LightGrey; color:black"|Positive Process | ||
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* | *dose 42mW/cm2 for 1,5um AZ5214E resist | ||
*dose 56mW/cm2 for 2,2um AZ5214E resist | |||
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* | *dose 23mW/cm2 for 1,5um AZ5214E resist | ||
*dose 35mW/cm2 for 2,2um AZ5214E resist | |||
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* | * | ||
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* | *polymer depended | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Negative Process | |style="background:LightGrey; color:black"|Negative Process | ||
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* | *dose 21mW/cm2 for 1,5um AZ5214E resist | ||
*dose 28mW/cm2 for 2,2um AZ5214E resist | |||
then 210mW/cm2 flood exposure after PEB | |||
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* | *dose 16mW/cm2 for 1,5um AZ5214E resist | ||
*dose 18mW/cm2 for 2,2um AZ5214E resist | |||
then 210mW/cm2 flood exposure after PEB | |||
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* | * | ||
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* | *polymer depended | ||
|- | |- | ||
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*<nowiki>1</nowiki> 150 mm wafers | *<nowiki>1</nowiki> 150 mm wafers | ||
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* | *all sizes up to 8inch | ||
|- | |- | ||
| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
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* | *All cleanroom materials | ||
* | *Dedicated 2inch chuck for III-V materials | ||
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* | *All cleanroom materials except III-V materials | ||
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*III-V compounds | *III-V compounds | ||
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* | *All cleanroom materials | ||
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