Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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 |style="background:LightGrey; color:black"|Exposure light/filters/spectrum
 |style="background:WhiteSmoke; color:black"|
-* 350W Hg-lamp, 365nm filter, intensity in Constant Intensity(CI) mode 7mW/cm2 @ 365 nm
+*350W Hg-lamp
+*365nm filter, intensity in Constant Intensity mode 7mW/cm2 @ 365 nm
 *303nm filter optional
 |style="background:WhiteSmoke; color:black"|
-* 350W Hg-lamp, SU8 filter, 365nm filter optional
+*350W Hg-lamp
-* intensity in Constant Intensity(CI) mode 7mW/cm2 @ 365 nm
+*SU8 filter, intensity in Constant Power mode 7mW/cm2 @ 365 nm
+*365nm filter optional
 |style="background:WhiteSmoke; color:black"|
 *