Jump to content

Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

Tigre (talk | contribs)
Tigre (talk | contribs)
Line 39: Line 39:
|style="background:LightGrey; color:black"|Exposure light/filters/spectrum
|style="background:LightGrey; color:black"|Exposure light/filters/spectrum
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* 350W Hg-lamp, 365nm filter, 303nm filter optional
* 350W Hg-lamp, 365nm filter, intensity in Constant Intensity(CI) mode 7mW/cm2 @ 365 nm
* intensity in Constant Intensity(CI) mode 7mW/cm2 @ 365 nm
*303nm filter optional
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* 350W Hg-lamp, SU8 filter, 365nm filter optional
* 350W Hg-lamp, SU8 filter, 365nm filter optional