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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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* 350W Hg-lamp, 365nm filter, 303nm filter optional
* 350W Hg-lamp, 365nm filter, 303nm filter optional
* intensity in Constant Intensity(CI) mode 7mJ/cm2  
* intensity in Constant Intensity(CI) mode 7mW/cm2  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* 350W Hg-lamp, SU8 filter, 365nm filter optional
* 350W Hg-lamp, SU8 filter, 365nm filter optional
* intensity in Constant Intensity(CI) mode 7mJ/cm2
* intensity in Constant Intensity(CI) mode 7mW/cm2
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*  
*  
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