Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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==Inclined UV lamp== | ==Inclined UV lamp== | ||
[[Image:Inclined UV lamp_1.jpg|200×200px| | [[Image:Inclined UV lamp_1.jpg|200×200px|left|thumb|Inclined UV lamp is placed in Cleanroom 13.]] | ||
The Inclined UV lamp is 1000 W Hg(Xe)lamp source designed for near UV, 350-450nm, mid UV, 260-320nm, and deep UV, 220-260nm exposures of resists and polymers. The exposure source can be also used to make an inclined exposure in air or in the media tank. | The Inclined UV lamp is 1000 W Hg(Xe)lamp source designed for near UV, 350-450nm, mid UV, 260-320nm, and deep UV, 220-260nm exposures of resists and polymers. The exposure source can be also used to make an inclined exposure in air or in the media tank. | ||