Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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== III-V Aligner == | == III-V Aligner == | ||
The SÜSS MicroTec MA1006 mask aligner located in the III-V cleanroom is dedicated for processing of III-V compound semiconductors. | |||
Specific use of the mask aligner can be found in the standard resist recipes. | |||
[[Image:IMG_3078.jpg|300x300px|thumb|III-V Aligner positioned in III-V cleanroom ]] | |||
{| border="2" cellspacing="0" cellpadding="10" | |||
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!style="background:silver; color:black" align="left" valign="top" rowspan="6"|Performance | |||
|style="background:LightGrey; color:black"|substrate size | |||
|style="background:WhiteSmoke; color:black"| | |||
small pieces 1x1 cm up to 2inch" | |||
|- | |||
|style="background:LightGrey; color:black"|Exposure mode | |||
|style="background:WhiteSmoke; color:black"| | |||
soft contact, hard contact, proximity, flood exposure | |||
|- | |||
| style="background:LightGrey; color:black"|Exposure light/filters | |||
|style="background:WhiteSmoke; color:black"| | |||
365 nm, 405 nm | |||
|- | |||
|style="background:LightGrey; color:black"|Minimum structure size | |||
|style="background:WhiteSmoke; color:black"| | |||
~1µm | |||
|- | |||
|style="background:LightGrey; color:black"|Mask size | |||
|style="background:WhiteSmoke; color:black"| | |||
5x5inch | |||
|- | |||
|style="background:LightGrey; color:black"|Alignment modes | |||
|style="background:WhiteSmoke; color:black"| | |||
Top side only | |||
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|} | |||
==Inclined UV lamp== | ==Inclined UV lamp== | ||