Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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== KS Aligner == | == KS Aligner == | ||
[[Image:KSaligner.jpg|300x300px|thumb|The KSaligner MA6 is placed in Cleanroom 3.]] | |||
SUSS Mask Aligner MA6 is designed for high resolution photolithography. | |||
The 365nm exposure wavelength version is capable of 1.25 (1.0) um resolution in vacuum contact. All contact exposure programs (vacuum, hard, soft, proximity) are supplied. | |||
Two alignment options are available: top side alignment (TSA) with a split field or a video microscope and back side alignment (BSA) with BSA microscope. It is also possible to make IR- light alignment. | |||
'''The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager:''' | |||
Equipment info in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=44 LabManager] | |||
== EVG Aligner == | == EVG Aligner == | ||