Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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== | ==Inclined UV lamp== | ||
[[Image:Opticoat.jpg|200×200px|right|thumb|The Manual Spinner(Polymers) is placed in fumehood in Cleanroom 3.]] | [[Image:Opticoat.jpg|200×200px|right|thumb|The Manual Spinner(Polymers) is placed in fumehood in Cleanroom 3.]] | ||
The | The Inclined UV lamp is 1000 W Hg(Xe)lamp source designed for near UV, 350-450nm, mid UV, 260-320nm, and deep UV, 220-260nm exposures of resists and polymers. The exposure source can be also used to make an inclined exposure in air or in the media tank. | ||
The toll was purchased in February 2009 from Newport company. The exposure lamp has a official name: Oriel Flood Exposure Source, unit 92540. All other parts of equipment: inclined substrate and mask holder with media tank, exhaust box around the tool, timer controller, were designed and build at Danchip workshop. | |||
The incleined substrate and mask holder with a media tank was designed as part of Master Thesis of DTU Nanotech | |||
There are 2 hotplates with temperature range up to 250C, placed in the same fumehood, which can be used for baking before/after spinning. | There are 2 hotplates with temperature range up to 250C, placed in the same fumehood, which can be used for baking before/after spinning. | ||