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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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|-
|Recipe name  
|Recipe name  
|SiH<math>_4</math> flow [sccm]
|SiH<sub>4</sub> flow [sccm]
|N<math>_2</math> flow [sccm]
|N<sub>2</sub> flow [sccm]
|GeH<math>_4</math> flow [sccm] (scaled by 100)
|GeH<sub>4</sub> flow [sccm] (scaled by 100)
|B<math>_2</math>H<math>_6</math> flow [sccm]
|B<sub>2</sub>H<sub>6</sub> flow [sccm]
|PH<math>_3</math> flow [sccm]
|PH<sub>3</sub> flow [sccm]
|Pressure [mTorr]
|Pressure [mTorr]
|Power [W]
|Power [W]
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