Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions
Appearance
| Line 116: | Line 116: | ||
|- | |- | ||
|LFSiO | |LFSiO | ||
|~ | |~75 | ||
|~1.48 | |~1.48 | ||
|<1 | |<1 | ||
| Line 116: | Line 116: | ||
|- | |- | ||
|LFSiO | |LFSiO | ||
|~ | |~75 | ||
|~1.48 | |~1.48 | ||
|<1 | |<1 | ||