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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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|Description
|Description
|-  
|-  
|Core-Ge
|Core-Ge (not possible anymore as we have no Germanium)
|17
|17
|1600
|1600
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|~1.458  
|~1.458  
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=Recipes on PECVD2 for deposition of silicon oxides <span style="color:Red">EXPIRED!!!</span>=
=Recipes on PECVD2 for deposition of silicon oxides <span style="color:Red">EXPIRED!!!</span>=