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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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|-
|-
|1PBSG
|1PBSG
|
|17
|
|1600
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|0
|
|135
|
|40
|
|500
|
|800LF
|Developed for waveguide top cladding by ''Haiyan Ou @DTU Photonics''
|Developed for waveguide top cladding by ''Haiyan Ou @DTU Photonics''
|-
|BGE_PBSG
|17
|1600
|0
|240
|60
|500
|800LF
|Low stress PBSG
|-
|-
|}
|}
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