Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions
No edit summary |
No edit summary |
||
| Line 24: | Line 24: | ||
|400 | |400 | ||
|380LF | |380LF | ||
|Developed for waveguides | |Process control recipe. Developed for waveguides | ||
|- | |- | ||
|1PBSG | |1PBSG | ||
| Line 39: | Line 39: | ||
===Expected results=== | ===Expected results=== | ||
{| border="1" cellspacing="0" cellpadding=" | {| border="1" cellspacing="0" cellpadding="5" | ||
|- | |- | ||
|Recipe name | |Recipe name | ||
| Line 45: | Line 45: | ||
|RI | |RI | ||
|Uniformity [%] | |Uniformity [%] | ||
|Comments | |||
|- | |- | ||
|1oxide/1ox_std/standard | |1oxide/1ox_std/standard | ||
| Line 50: | Line 51: | ||
|1.46 | |1.46 | ||
|2 | |2 | ||
|The latest measured values can be seen in the process control sheet in LabManager | |||
|- | |- | ||
|1PBSG | |1PBSG | ||
|~0.3 | |~0.3 | ||
| | |||
| | | | ||
| | | | ||