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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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2,908 edits
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|LFSiO
|LFSiO
|12
|12
|1420 (setting i software is 710)
|1420 (setting in software is 710)
|392
|392
|550
|550
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LF=Low Frequency  
LF=Low Frequency


===Expected results===
===Expected results===
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