Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions
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==BPSG: RI vs. B/P == | ==BPSG: RI vs. B/P <span style="color:Red">EXPIRED!!!</span> == | ||
B2H6 flow and PH3 flow was varied to map the RI of different B2H6/PH3 ratios. <br> | B2H6 flow and PH3 flow was varied to map the RI of different B2H6/PH3 ratios. <br> | ||
''Work done by BGHE@danchip in fall 2013'' <br> | ''Work done by BGHE@danchip in fall 2013'' <br> | ||