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LabAdviser/Technology Research/Fabrication of Hyperbolic Metamaterials using Atomic Layer Deposition/TiO2 Q plates: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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!1.12
!1.12
|Selective etch of Si between ALD TiO<sub>2</sub> coatings.
|Selective etch of Si between ALD TiO<sub>2</sub> coatings.
|Si etching proceeds using Reactive Ion Etching (RIE) with isotropic process based on SF<sub>f</sub> process gas.
|Si etching proceeds using Reactive Ion Etching (RIE) with isotropic process based on SF<sub>6</sub> process gas.
||Equipment used: [[Specific_Process_Knowledge/Etch/RIE_(Reactive_Ion_Etch)|RIE2]].  
||Equipment used: [[Specific_Process_Knowledge/Etch/RIE_(Reactive_Ion_Etch)|RIE2]].  
|[[image:Image6_ALD_Final_structure.jpg|250x350px|center]]
|[[image:Image6_ALD_Final_structure.jpg|250x350px|center]]
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