Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions
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|This recipe is not running stable. The load capacitor tunes to zero and that it cannot go further. The results in a small reflected power that is varying due to the bad matching. This lead to variations in results from time to time. You may use it if you like, but please expect some variation in deposition rate. | |This recipe is not running stable. The load capacitor tunes to zero and that it cannot go further. The results in a small reflected power that is varying due to the bad matching. This lead to variations in results from time to time. You may use it if you like, but please expect some variation in deposition rate. | ||
|This recipe was developed because the old one didn't tune well. It may have a less good uniformity but should be more stable. | |||
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