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LabAdviser/Technology Research/Fabrication of Hyperbolic Metamaterials using Atomic Layer Deposition/EMT Procces flow: Difference between revisions

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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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|The best quility wafer selects and cleaves in four pieces.  
|The best quility wafer selects and cleaves in four pieces.  
| [[Specific_Process_Knowledge/Characterization/Optical_microscope|Optical Microscopy]].
| [[Specific_Process_Knowledge/Characterization/Optical_microscope|Optical Microscopy]].
|[[image:3_ALD.JPG|250x350px|center|]]
|[[image:3_Captured_10x19_defects_in_SiN.jpg|250x350px|center|]]
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|Deposition using recipies <b>EMA01</b>, <b>EMA02</b>, <b>EMA03</b> and <b>EMA04</b>.
|Deposition using recipies <b>EMA01</b>, <b>EMA02</b>, <b>EMA03</b> and <b>EMA04</b>.
|[[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200|ALD Picosun R200]], <b>EMA01-04</b> Recipes description and performance: [[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers#Low_temperature_grown_multilayers_on_flat_surfaces|Multilayrs recipes and their performance]]  .
|[[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200|ALD Picosun R200]], <b>EMA01-04</b> Recipes description and performance: [[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers#Low_temperature_grown_multilayers_on_flat_surfaces|Multilayrs recipes and their performance]]  .
|[[image:2 lithography mask 1.jpg|250x350px|center]]
|[[image:3_ALD.JPG|250x350px|center]]
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