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LabAdviser/Technology Research/Fabrication of Hyperbolic Metamaterials using Atomic Layer Deposition/EMT Procces flow: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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!2.2
!2.2
|Deposition of 1 µm Si<sub>3</sub>N<sub>4</sub> layer
|Deposition of 1 µm Si<sub>3</sub>N<sub>4</sub> layer
|Deposition carries 7 times inorder to get 1 µm thick film
|Deposition carries 7 times in order to get 1 µm thick film
|[[Specific_Process_Knowledge/Thin_film_deposition/Furnace_LPCVD_Nitride/Deposition_of_stoichiometric_nitride_using_the_6"_LPCVD_nitride_furnace|6" LPCVD nitride furnace]].  
|[[Specific_Process_Knowledge/Thin_film_deposition/Furnace_LPCVD_Nitride/Deposition_of_stoichiometric_nitride_using_the_6"_LPCVD_nitride_furnace|6" LPCVD nitride furnace]].  
|[[image:1 Resist back.jpg|250x350px|center|]]
|[[image:1 Resist back.jpg|250x350px|center|]]
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