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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
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|Power [W]
|Power [W]
|Description
|Description
|-
|LFSiO2
|12
|1420
|392
|0
|0
|700
|150
|New QC implemented in April 2016
|-  
|-  
|LFSiO
|LFSiO
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