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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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==1SiO2_HR, High Rate==
==SiO2, High Rate==






{| border="1" style="text-align: center; width: 400px; height: 150px;"
{| border="1" style="text-align: center; width: 400px; height: 150px;"
! colspan="2" style="text-align: center;" style="background: #efefef;" | SiO2 Standard
! colspan="2" style="text-align: center;" style="background: #efefef;" | 1SiO2HR
|-
|-
!N<math>_2</math>O-flow
!N<math>_2</math>O-flow
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