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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
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|-
|-
!Deposition rate
!Deposition rate
|179 nm/min
|179 nm/min (before 2014)
|-
|-
!index of refraction
!index of refraction
|1.461
|1.461 (before 2014)
|}
|}


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